Osaka-fu, Japan

Noritaka Oyama


Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 67(Granted Patents)


Location History:

  • Osaka, JP (2003)
  • Osaka-fu, JP (2000 - 2006)

Company Filing History:


Years Active: 2000-2006

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3 patents (USPTO):Explore Patents

Title: Noritaka Oyama: Innovator in Semiconductor Technology

Introduction

Noritaka Oyama is a prominent inventor based in Osaka-fu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have led to advancements in the production and fabrication of electronic components.

Latest Patents

One of Oyama's latest patents is a method for the production of semiconductor packages. This invention outlines a process that includes forming electronic circuits on a wafer, encapsulating the circuits with a sealant, and utilizing screen printing to reduce equipment costs compared to conventional methods. Another notable patent is a fabrication method for electronic components, which aims to reduce the size of components by making the semiconductor substrate thinner while ensuring durability for mobile phone applications. This method involves multiple application processes and a separation process to create individual electronic components.

Career Highlights

Throughout his career, Noritaka Oyama has worked with several companies, including Sanyu Rec Co., Ltd. and Japan Rec Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to the advancement of semiconductor technologies.

Collaborations

Oyama has collaborated with notable coworkers such as Atsushi Okuno and Noriko Fujita. Their combined expertise has fostered an environment of innovation and creativity in their projects.

Conclusion

Noritaka Oyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of electronic components, paving the way for future advancements.

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