Norio Satou

Title: Norio Satou: Innovator in Pattern Defect Analysis

Introduction

Norio Satou is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of pattern defect analysis, holding a total of 6 patents. His work focuses on enhancing the accuracy and efficiency of defect detection in various substrates.

Latest Patents

Satou's latest patents include innovative technologies such as pattern defect analysis equipment, a pattern defect analysis method, and a pattern defect analysis program. These inventions involve a data processing unit that acquires a review image containing a pattern defect on a substrate. The unit compares this review image with a reference image that includes no pattern defect, allowing for the extraction of a defect image. Furthermore, it performs alignment between the review image and a self-layer design pattern image generated from design data belonging to the same layer. Based on the alignment results, the data processing unit generates another-layer design pattern image from design data belonging to a different layer. This process helps determine the relative position relationship between the pattern defect and a pattern belonging to another layer, ultimately judging the criticality based on this relationship.

Another notable patent involves an image forming method and a charged particle beam apparatus. This technology is designed to suppress the inclination of charging when scanning a two-dimensional area with a charged particle beam. The method includes scanning a third line located between the first and second scanning lines, followed by scanning multiple lines between the first and third, as well as between the second and third scanning lines.

Career Highlights

Norio Satou is currently employed at Hitachi High-Technologies Corporation, where he continues to develop cutting-edge technologies in his field. His work has significantly impacted the industry, particularly in improving defect analysis processes.

Collaborations

Throughout his career, Satou has collaborated with notable colleagues, including Atsushi Kobaru and Hidetoshi Morokuma. These partnerships have fostered innovation and contributed to the advancement of their shared goals in technology development.

Conclusion

Norio Satou is a distinguished inventor whose work in pattern defect analysis has led to several important patents. His contributions continue to shape the landscape of technology in Japan and beyond.