This inventor holds 7 USPTO granted patents. Top assignees: Nippon Kogaku K.k., Nikon Corporation. Active years: 1982-1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1982-1990
Title: Norio Fujii: Innovator in Pattern Inspection Technology
Introduction
Norio Fujii is a prominent inventor based in Urawa, Japan, known for his significant contributions to the field of pattern inspection technology. With a total of 7 patents to his name, Fujii has developed innovative solutions that enhance the accuracy and efficiency of pattern inspections in various applications.
Latest Patents
Fujii's latest patents include a "Pattern Inspecting Apparatus" and an "Apparatus for Detecting Defects in Pattern." The Pattern Inspecting Apparatus is designed to accurately inspect patterns by processing design image data in correspondence with the resizing of the pattern. It extracts image data from input information represented by binary logic levels and adds additional data to specific pixel positions based on the distribution of image logic levels. This innovation allows for precise resizing of pattern image data.
The Apparatus for Detecting Defects in Pattern consists of an imaging device that generates image information of a pattern with light and dark areas. It includes a detector that signals when the boundary line between these areas is bent in a specific manner. A memory component stores signals corresponding to the detected bends, enabling the inspecting device to determine the presence or absence of defects based on the design information.
Career Highlights
Throughout his career, Norio Fujii has worked with notable companies such as Nippon Kogaku K.K. and Nikon Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optical technology and pattern inspection.
Collaborations
Fujii has collaborated with talented individuals in his field, including Atsushi Kawahara and Junji Hazama. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Norio Fujii's work in pattern inspection technology showcases his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in pattern analysis, making significant strides in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile