Nippon Kogaku K.k.

Nikon Corporation

Norio Fujii

Atsushi Kawahara

Junji Hazama

Toru Azuma

Kazunari Hada

Masahiro Sawada

Makoto Takagi

Yoshihiko Fujimori

Kaoru Kikuchi

A pattern inspection apparatus for accurately inspecting a pattern such that design image data is processed in correspondence to resizing of a pattern to be inspected. Image data corresponding to an image area of a predetermined size is extracted from input information represented by binary logic levels and representing a pattern to be resized. Template circuits add additional data of a predetermined logic level to a predetermined pixel position when a distribution of the image logic levels included in the extracted image data is a predetermined distribution. Thus, the additional data is added to the pattern image data to resize the pattern.

Pattern inspecting apparatus

An apparatus for inspecting a pattern consisting of light and dark areas formed on a planar test specimen according to design information, comprising: an imaging device for viewing the pattern to generate image information; a detector for generating a first signal upon detection that, in response to the image information, a boundary line between the light and dark areas of the pattern is bent in a determined stepping form in the direction of the plane; a memory for generating and storing a second signal, upon detection that the boundary line of the pattern has a bend of stepping form according to the design information, corresponding to the position in the imaging area of the bend in the design information; and an inspecting device for discriminating, upon generation of the first signal, the presence or absence of the second signal in the memory corresponding to the position of the first signal in the image area.

Apparatus for detecting defects in pattern

Two-dimensional pattern detecting apparatus provided with register for serially receiving binary signals obtained from analog signals of a two-dimensional pattern and adapted to divide the pattern into pixels and to represent the density of bright and dark for pixels by the binary signals. The apparatus further includes a processing circuit adapted to compare with predetermined patterns a pattern composed of 8 peripheral pixels of a partial area of 3.times.3 pixels within the two-dimensional pattern, on the basis of the binary signals stored in the register. The processing circuit outputs a binary signal of a logic value stored in said register corresponding to a central pixel of the partial area when the pattern of the 8 pixels coincides with one of said predetermined patterns, and to outputs a binary signal of a logic value prevailing in 8 binary signals stored in the register corresponding to the 8 pixels when the pattern of the 8 pixels does not coincide with any of the predetermined patterns.

Apparatus for detecting two-dimensional pattern and method for

A pattern examining in which a pattern on an examined object such as reticle or mask is scanned to produce image binary signals of picture elements; binary information corresponding to a local area on the examined object is serially extracted from the image binary signals; and shape detection is effected for detecting by means of the binary information whether or not the pattern in the local area possesses a determined geometric shape or characteristics. The result of the shape detection is compared with the information on design relating to the geometric shape or characteristics which the pattern on the examined object should possess.

Apparatus for detecting the defect of pattern

A pattern defect testing apparatus comprises a first detection circuit which defines a first detection area on a two-dimensional pattern and produces a first detection signal when all digital signals representative of densities of picture cells in the first detection area have the same logical value, a second detection circuit which defines a second detection area on the two-dimensional pattern and produces a second detection signal when at least one of digital signals representative of densities of picture cells in the second detection area has a logical value different from that of the digital signals to the first detection circuit, and a discriminating circuit for discriminating the presence of a defect in the second detection area when the first and second detection signals are produced.

Pattern testing apparatus

An automatic focusing device of a microscope having an objective lens and a stage on which a specimen is placed comprises distance varying means for varying the relative distance between the objective lens and the stage, distance detecting means for producing a distance output corresponding to said distance, photoelectric detector means for photoelectrically detecting a high frequency component of the space frequency component of the image of the specimen on the stage by the objective lens, judging means for judging whether or not a predetermined peak smaller than a maximum peak exists in the output of the photoelectric detector means within a predetermined distance range from a first distance output of the distance detecting means when the output of the photoelectric detector means assumes said maximum peak and for producing an in-focus output when said predetermined peak exists, and means for determining said relative distance on the basis of said in-focus output.

Automatic focusing device of a microscope

Apparatus for automatically typing HLA (Human Leukocyte Antigen) is disclosed. An optical image of a sample containing lymphocytes is formed by a phase-contrast microscope. The optical image is transformed into electrical picture signal through a image pick-up unit which in turn is transformed into binary picture patterns for a predetermined area site in the image through a window circuit. The obtained binary picture patterns are compared with template patterns of predetermined features corresponding to reacted and non-reacted lymphocyte images to detect and type the lymphocyte image. With this typing apparatus, HLA typing test can be conducted automatically with high accuracy.

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Urawa, Japan

Norio Fujii