Yokohama, Japan

Norimasa Nishimura


Average Co-Inventor Count = 6.1

ph-index = 4

Forward Citations = 103(Granted Patents)


Location History:

  • Hadano, JP (2002)
  • Yokohama, JP (2001 - 2003)

Company Filing History:


Years Active: 2001-2003

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4 patents (USPTO):Explore Patents

Title: Innovator Norimasa Nishimura: Pioneering Advancements in Semiconductor Processing

Introduction: Norimasa Nishimura, an esteemed inventor based in Yokohama, Japan, has made significant contributions to the field of semiconductor processing through his inventive spirit and technical expertise. With a portfolio of four patents, his work focuses on enhancing the efficiency and effectiveness of sample processing in electron particle machines.

Latest Patents: Nishimura's latest patents exemplify his commitment to innovation:

1. **Sample Processing Apparatus and Method for Removing Charge on Sample Through Light Irradiation** - This invention addresses the challenges associated with semiconductor wafer processing. It involves a light source in a preparation chamber that, when combined with a chucking stage, effectively removes accumulated charges on the semiconductor wafer after inspection or analysis. The application of light provides conductivity to the wafer's surface, facilitating charge removal through grounding.

2. **Method and Apparatus for Observing or Processing and Analyzing Using a Charged Beam** - In this innovative method, ultraviolet light is employed to transform an insulating film on a sample into a conductive material, allowing for effective observation and analysis. This transformation helps prevent repulsion of charged particles, ensuring accurate results during the processing of the semiconductor substrate.

Career Highlights: Throughout his career at Hitachi, Ltd., Norimasa Nishimura has positioned himself as a leading figure in semiconductor technologies. His relentless pursuit of innovation has led to advancements that not only improve the functionality of existing technologies but also pave the way for future discoveries in the field.

Collaborations: Nishimura has worked closely with esteemed colleagues such as Akira Shimase and Junzou Azuma. Together, they have shared insights and collaborated on various projects, further enhancing the collective expertise of Hitachi and contributing to the company’s reputation as a pioneer in technological advancements.

Conclusion: Norimasa Nishimura stands out as a prominent inventor in the realm of semiconductor processing. His patents reflect a deep understanding of the challenges within the industry and an unwavering dedication to overcoming them. Through his innovative approaches, he continues to influence the future of semiconductor technologies and inspire fellow inventors worldwide.

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