Norimasa Nagase

Title: Norimasa Nagase: Innovator in Photomask Pattern Technologies

Introduction

Norimasa Nagase is a distinguished inventor based in Kawasaki, Japan, recognized for his contributions to the semiconductor industry. With a total of two patents to his name, Nagase has made significant advancements in methodologies related to photomask pattern data and optical proximity effect corrections.

Latest Patents

Norimasa Nagase's latest patents include innovative methods that optimize the process of creating pattern data for photomask patterns. The first patent outlines a method for making pattern data that incorporates a hierarchical structure. This method involves adding information from higher-level cells and forming cell groups based on optical proximity effects. The second patent elaborates on a method for performing optical proximity effect corrections to a first photomask pattern intended for semiconductor device wiring. This method utilizes computer systems to process and extract relevant layout data for efficient design.

Career Highlights

Nagase has established himself as a key player in the field while working at Fujitsu Semiconductor Limited. His technical expertise and inventive mind have allowed him to develop methodologies that improve the precision and efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Norimasa Nagase has collaborated with notable colleagues, including Koichi Suzuki and Muneto Saito. These partnerships have facilitated the sharing of knowledge and fostered an environment of innovation within their team at Fujitsu Semiconductor Limited.

Conclusion

Norimasa Nagase is an exemplary inventor whose work continues to influence the semiconductor industry through innovative solutions for photomask pattern data and optical proximity effects. His contributions not only enhance manufacturing efficiency but also pave the way for further developments in semiconductor technologies.