The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Mar. 17, 2009
Muneto Saito, Kawasaki, JP;
Koichi Suzuki, Kawasaki, JP;
Mitsuo Sakurai, Kawasaki, JP;
Norimasa Nagase, Kawasaki, JP;
Muneto Saito, Kawasaki, JP;
Koichi Suzuki, Kawasaki, JP;
Mitsuo Sakurai, Kawasaki, JP;
Norimasa Nagase, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.