Norikazu Kainuma

Title: Norikazu Kainuma: Innovator in Sputtering Technology

Introduction

Norikazu Kainuma is a prominent inventor based in Yamagata, Japan. He has made significant contributions to the field of sputtering technology, holding a total of five patents. His innovative work has advanced the methods used in thin film deposition, which is crucial for various applications in electronics and materials science.

Latest Patents

Kainuma's latest patents include a magnetron sputtering system that generates a high-density plasma on a target. This system applies magnetic fields intersecting with an electric field using multiple rotatably supported magnets. The design prevents the time variation of regions where the magnetic field is orthogonal to the electric field from becoming monotonous. Additionally, he has developed a sputtering system and method for depositing thin films on disc substrates. This system facilitates high precision positioning of inner and outer masks, allowing for effective thin film deposition in uncovered regions of the substrate.

Career Highlights

Kainuma is currently employed at Tohoku Seiki Industries, Ltd., where he continues to innovate in the field of sputtering technology. His work has been instrumental in enhancing the efficiency and effectiveness of thin film deposition processes.

Collaborations

Kainuma has collaborated with notable colleagues, including Masayoshi Yokoo and Koichi Yoshida. Their combined expertise has contributed to the advancement of sputtering technologies and their applications.

Conclusion

Norikazu Kainuma's contributions to sputtering technology and thin film deposition have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology in this area.