The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Feb. 08, 2005
Keitaro Harada, Yamagata, JP;
Masayoshi Yokoo, Yamagata, JP;
Norikazu Kainuma, Yamagata, JP;
Yoshinobu Takano, Yamagata, JP;
Isao Tanikawa, Kanagawa, JP;
Keitaro Harada, Yamagata, JP;
Masayoshi Yokoo, Yamagata, JP;
Norikazu Kainuma, Yamagata, JP;
Yoshinobu Takano, Yamagata, JP;
Isao Tanikawa, Kanagawa, JP;
Tohoku Seiki Industries, Ltd., Yamagata, JP;
Abstract
A magnetron sputtering system generates a high density plasma on a target by applying magnetic fields intersecting an electric field by using a plurality of magnets that are rotatably supported. The respective magnets are revolved and rotated so that the time variation of regions where a magnetic field (line of magnetic force) generated by the each magnet is orthogonal to an electric field is prevented from becoming monotonous. Further, the respective magnets are arranged to make the distances between the center of rotation and the center of revolution of the respective magnets different from each other, so that the regions where the magnetic field (line of magnetic force) generated by the each magnet is orthogonal to the electric field are dispersed in the radial direction of a target.