Location History:
- Ayase, JP (1983 - 1990)
- Yokohama, JP (2010)
- Kanagawa, JP (1991 - 2013)
- Yamagata, JP (2013)
Company Filing History:
Years Active: 1983-2013
Title: The Innovations of Isao Tanikawa: A Leader in Sputtering Technology
Introduction
Isao Tanikawa, an accomplished inventor based in Ayase, Japan, has made significant contributions to the field of sputtering technology. With 13 patents to his name, Tanikawa's work focuses on advanced systems that enhance the efficiency and precision of thin film deposition. His innovations reflect a deep understanding of magnetron sputtering systems and their applications in various industries.
Latest Patents
Among his most notable inventions is a sophisticated magnetron sputtering system. This innovative system generates high-density plasma on a target by applying magnetic fields intersecting with an electric field using multiple rotatably supported magnets. The design prevents time variations of regions where magnetic fields are orthogonal to the electric fields from becoming monotonous. By varying the distances between the centers of rotation and revolution of each magnet, Tanikawa ensures that these regions are dispersed radially across the target, enhancing performance.
Another significant patent is related to a sputtering system and method for depositing thin films. This system allows for high precision positioning of both inner and outer masks over a disc substrate. The mask member covers a partial region of the substrate to facilitate thin film deposition in uncovered areas. Tanikawa's design includes a mechanism for the mechanical holding and releasing of both the substrate holder and the mask member, making the entire process streamlined and efficient.
Career Highlights
Throughout his career, Isao Tanikawa has worked with reputable companies including Toyo Seikan Kaisha, Ltd. and Tohoku Seiki Industries, Ltd. His roles at these organizations have enabled him to further his research and development efforts in sputtering and thin film technology.
Collaborations
Tanikawa has collaborated with notable professionals in the industry, including Sadao Hirata and Yoshitsugu Maruhashi. Their collective expertise has contributed to the advancement of sputtering technologies and has led to several patented innovations.
Conclusion
Isao Tanikawa stands out as a key figure in the realm of sputtering technology. His 13 patents underscore his dedication to innovation and the enhancement of thin film deposition processes. As the industry continues to evolve, Tanikawa's contributions will undoubtedly remain influential in shaping future advancements in this critical field.