Location History:
- Kikuchi-Gun, JP (2003)
- Koshi, JP (2013)
Company Filing History:
Years Active: 2003-2013
Title: Norikatsu Sato: Innovator in Substrate Processing Technology
Introduction
Norikatsu Sato is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His innovative work focuses on developing devices and methods that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Sato's latest patents include a developing device, developing method, and storage medium. One of his notable inventions involves a developer nozzle that supplies developer onto the surface of a substrate rotating around a vertical axis. A pure water nozzle is also utilized to supply pure water onto the substrate's surface. The design ensures that the pure water nozzle is spaced apart from the developer nozzle, which helps to restrict the flow of the developer and allows it to spread effectively when the substrate rotates. This innovative approach results in the formation of a liquid film containing both the developer and pure water on the substrate.
Another significant patent by Sato describes a substrate processing apparatus and method. This invention features a cassette station, a processing station with a coating unit and a developing unit, and an inspecting station equipped with film thickness and defect inspecting apparatuses. The arrangement of these stations simplifies the operations from substrate processing to inspection, allowing for automatic transfer of wafers and reducing the time required for these processes.
Career Highlights
Norikatsu Sato is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing substrate processing technologies, making him a valuable asset to his organization.
Collaborations
Sato has collaborated with notable coworkers, including Kunie Ogata and Yoshio Kimura. Their combined expertise has contributed to the successful development of innovative technologies in the field.
Conclusion
Norikatsu Sato's contributions to substrate processing technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.