Tokyo, Japan

Norikatsu Nakamura

This inventor holds 5 USPTO granted patents. Top assignees: Dai Nippon Printing Co., Ltd., Gmc Hillstone Co., Ltd., Junji Kido. Active years: 2007-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norikatsu Nakamura. Retrieved from https://idiyas.com/inventor/norikatsu-nakamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Tokyo-to, JP (2008)
  • Tokyo, JP (2007 - 2011)

Company Filing History:


Years Active: 2007-2011

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5 patents (USPTO):Explore Patents

Title: **Norikatsu Nakamura: Pioneer in Plasma Processing Technologies**

Introduction

Norikatsu Nakamura, an innovative inventor based in Tokyo, Japan, has made significant contributions to the field of plasma processing. With a total of five patents to his name, Nakamura's work focuses on enhancing plasma processing methods and apparatus, playing a crucial role in various industrial applications.

Latest Patents

Nakamura's latest patents include advanced designs for plasma processing methods and apparatus. One notable patent describes a method whereby plasma processing is conducted using a pair of electrodes that are movable relative to one another. This design allows for the precise placement of an object to be processed on the second electrode, facing the first electrode. The inclusion of a blocking member at both ends of the second electrode ensures that the plasma processing space remains contained. When a voltage is applied to both electrodes, and a process gas is introduced, plasma is generated and irradiated onto the object.

In another invention, Nakamura presents a plasma processing apparatus comprising a first and a second electrode, which are positioned to allow for the processing of an object placed between them. Here, a solid dielectric material is employed to connect the processing boundaries, and a voltage is applied to facilitate plasma discharge while the electrodes move relative to one another. These innovative methods serve to enhance the efficiency and effectiveness of plasma processing in various applications.

Career Highlights

Nakamura's career includes significant tenure at reputable organizations, including Dai Nippon Printing Co., Ltd. and Junji Kido. His experiences at these companies have honed his skills as a creator and innovator in the field of plasma technology, further establishing him as an authority in his domain.

Collaborations

Throughout his professional journey, Nakamura has collaborated with talented individuals such as Yusuke Uno and Hiroki Sakata. These partnerships have played a pivotal role in advancing O(nakamura's innovative ideas and have contributed to the successful development of his patented technologies.

Conclusion

Norikatsu Nakamura's impact in the realm of plasma processing is undeniable. With his inventive designs and methodologies, he continues to influence industries reliant on advanced plasma technologies. As he moves forward, his contributions to innovation are expected to lead to even more groundbreaking developments in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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