Noriiki Masuda

Title: Innovative Contributions of Inventor Noriki Masuda

Introduction: Noriki Masuda, located in Miyagi, Japan, is a prolific inventor known for his contributions to semiconductor temperature control and substrate processing methods. With a total of four patents to his name, Masuda has significantly impacted the field of technology through his inventive solutions.

Latest Patents: Masuda's latest patents include a groundbreaking temperature control method designed for semiconductor wafers. This method includes a supply process that introduces a heat transfer gas into the gap between the semiconductor wafer and the mounting table, while also measuring temperature variations due to heat exchange, calculating correction values, and controlling power to achieve target temperatures. Another noteworthy invention is related to a substrate processing system. This technology offers a means to uniformly process a substrate surface by supplying gas through a specially designed shower head, effectively partitioning gas flow to optimize treatment on both the central and peripheral sections of the substrate.

Career Highlights: Masuda is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics sector. His work there exemplifies a commitment to advancing manufacturing processes that enhance efficiency and reliability within the industry.

Collaborations: In his journey as an inventor, Masuda has collaborated with notable colleagues, including Takari Yamamoto and Kenichiro Nakamura. These collaborations have fostered innovative ideas and applications in their respective fields, promoting advancements that benefit the broader technology landscape.

Conclusion: Noriki Masuda's inventive spirit and technical expertise have culminated in valuable patents that further the capabilities of semiconductor technology. Through his career and collaborations, he continues to play a vital role in the evolution of innovative solutions within the industry.