Tokyo, Japan

Norihito Itou

This inventor holds 2 USPTO granted patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2006-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihito Itou. Retrieved from https://idiyas.com/inventor/norihito-itou-5rtas9ee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Tokyo, JP (2006)
  • Tokyo-to, JP (2008)

Company Filing History:


Years Active: 2006-2008

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2 patents (USPTO):Explore Patents

Title: Norihito Itou: Innovator in Electroluminescent Technology

Introduction

Norihito Itou is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of electroluminescent technology, holding 2 patents that showcase his innovative methods in manufacturing electroluminescent devices.

Latest Patents

Itou's latest patents include a "Method for manufacturing electroluminescent element" and a "Method for manufacturing electroluminescent device." The main objective of these inventions is to provide a method that avoids the unnecessary layering of materials during the photolithography process. This innovation enables a quicker and easier peeling treatment of unnecessary layers, enhancing the efficiency of manufacturing electroluminescent elements.

Career Highlights

Norihito Itou is associated with Dai Nippon Printing Co., Ltd., where he applies his expertise in developing advanced manufacturing techniques for electroluminescent devices. His work has been instrumental in improving the production processes within the company.

Collaborations

Itou collaborates with Tomoyuki Tachikawa, contributing to the advancement of electroluminescent technology through their combined efforts.

Conclusion

Norihito Itou's innovative work in electroluminescent technology has positioned him as a key figure in the field. His patents reflect a commitment to enhancing manufacturing processes, making significant strides in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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