The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2006

Filed:

Jan. 08, 2003
Applicants:

Norihito Itou, Tokyo, JP;

Tomoyuki Tachikawa, Tokyo, JP;

Inventors:

Norihito Itou, Tokyo, JP;

Tomoyuki Tachikawa, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09K 11/00 (2006.01); H01J 9/227 (2006.01);
U.S. Cl.
CPC ...
Abstract

A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers. In order to achieve the aforementioned object, the present invention provides a method for manufacturing an electroluminescent element by photolithography, comprising: a process of providing a light-emitting portion of at least one color, having a photoresist layer on a surface thereof, on a substrate; a process of forming a heterochromatic light-emitting layer by coating the substrate with a heterochromatic light-emitting layer forming coating solution which expresses a different color from the color of the above light-emitting portion; a process of forming a photoresist layer for the heterochromatic light-emitting layer by coating the heterochromatic light-emitting layer with a photoresist; a process of pattern-exposing and developing the photoresist layer for the heterochromatic light-emitting layer, such that portions of the photoresist layer for the heterochromatic light-emitting layer which the heterochromatic light-emitting portion is to be formed, are remained; and a process of forming the heterochromatic light-emitting portion, having the photoresist layer for the heterochromatic light-emitting layer on the surface thereof, in a pattern by removing portions of the heterochromatic light-emitting layer which the photoresist layer for the heterochromatic light-emitting layer is removed.


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