Tenri, Japan

Norihiro Tokuyama

This inventor holds 3 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1994-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiro Tokuyama. Retrieved from https://idiyas.com/inventor/norihiro-tokuyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Tenri, JP (1994 - 1997)
  • Kasaoka, JP (1999)

Company Filing History:


Years Active: 1994-1999

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3 patents (USPTO):Explore Patents

Title: Norihiro Tokuyama: Innovator in Semiconductor Technology

Introduction

Norihiro Tokuyama is a prominent inventor based in Tenri, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Tokuyama's latest patents include a semiconductor device and a method of manufacturing the same. In his first patent, he describes a process where a field oxide film is formed on a P-type semiconductor substrate. This is followed by ion implantation of boron to create a channel stopper layer, leading to the formation of a MOS FET in the active region of the substrate. The method also involves ion implantation of phosphorus to form impurity layers under the source/drain regions of the MOS FET.

His second patent outlines a method for producing a semiconductor device with a LDD structure. This involves a semiconductor substrate laminated with an insulating film and a polysilicon layer. The process includes the removal of certain layers while preserving the insulating layer, followed by the implantation of impurities to form source and drain regions.

Career Highlights

Tokuyama is associated with Sharp Kabushiki Kaisha Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, which are essential for various electronic applications.

Collaborations

Throughout his career, Tokuyama has collaborated with notable colleagues, including Hiroshi Ishihara and Masaru Yuki. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Norihiro Tokuyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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