Tokyo, Japan

Norihiko Nonaka

This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: Hitachi, Ltd.. Active years: 2005-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiko Nonaka. Retrieved from https://idiyas.com/inventor/norihiko-nonaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Chiyoda, JP (2005)
  • Tokyo, JP (2017 - 2022)

Company Filing History:


Years Active: 2005-2022

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4 patents (USPTO):Explore Patents

Title: Norihiko Nonaka - Innovator in Design Support Systems

Introduction

Norihiko Nonaka is an inventor based in Tsuchiura-shi, Japan. He has made significant contributions to the field of design support systems. His innovative approach focuses on optimizing design processes through the extraction of common parts.

Latest Patent Applications

Norihiko Nonaka has filed a patent application for a Design Support System. This system addresses the need for a method that extracts common parts while considering their relation to performance. The apparatus and method utilize multi-objective optimization to acquire these common parts. Specifically, the design support system includes several means. One means enters information about a shape model, analysis condition, and optimization condition. Another means employs a multi-objective genetic algorithm to perform optimization. Additionally, the system groups a Pareto solution as an acquired optimization result, analyzes the dispersion of design variables, and associates them with a shape model. Finally, the system displays the common parts.

Conclusion

Norihiko Nonaka's work in developing a design support system showcases his innovative thinking and dedication to improving design methodologies. His contributions, although not yet reflected in granted patents, highlight the potential for advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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