Kawasaki, Japan

Noriaki Tokuda

This inventor holds 9 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 1994-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriaki Tokuda. Retrieved from https://idiyas.com/inventor/noriaki-tokuda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 77.8

Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 96(Granted Patents)


Location History:

  • Kanagawa-ken, JP (1997 - 2000)
  • Kawasaki, JP (1994 - 2005)

Company Filing History:


Years Active: 1994-2005

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9 patents (USPTO):Explore Patents

Title: Noriaki Tokuda: Innovator in Light Exposure Technology

Introduction

Noriaki Tokuda is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of light exposure technology, holding a total of 9 patents. His work primarily focuses on enhancing the efficiency and effectiveness of exposure apparatuses used in various applications.

Latest Patents

One of Tokuda's latest patents is a mask-holding apparatus for a light exposure apparatus and a related scanning-exposure method. This invention involves an exposure apparatus designed to expose a substrate with an image of a pattern formed on a mask. It includes an illumination system that illuminates the mask with exposure light and a projection optical system that projects the illuminated pattern onto the substrate. The mask is securely supported on a movable mask stage, and a mask holder is provided to support the mask from below, while a pressing member applies a prescribed force from above.

Another notable patent is the projection exposure apparatus, which is a scan-type projection exposure apparatus. This device features an illumination optical system that forms a slit-shaped illumination area on a mask pattern using illuminating light. It also includes a projection optical system that forms an image of the pattern on a substrate. The apparatus consists of a mask stage that moves while holding the mask, a substrate stage that moves two-dimensionally while holding the substrate, and a control system that synchronously scans both stages.

Career Highlights

Noriaki Tokuda has built a successful career at Nikon Corporation, where he has been instrumental in developing advanced imaging technologies. His innovative designs and patents have significantly impacted the field of photolithography and exposure systems.

Collaborations

Throughout his career, Tokuda has collaborated with notable colleagues, including Kenji Nishi and Shigeru Hagiwara. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their field.

Conclusion

Noriaki Tokuda's contributions to light exposure technology through his patents and work at Nikon Corporation highlight his role as a leading inventor in the industry. His innovative solutions continue to shape the future of imaging technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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