The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2005

Filed:

May. 06, 2003
Applicants:

Yasuo Araki, Yokohama, JP;

Noriaki Tokuda, Kawasaki, JP;

Masahiko Yasuda, Kawasaki, JP;

Shinji Mizutani, Kawasaki, JP;

Hiroaki Narushima, Tokyo, JP;

Inventors:

Yasuo Araki, Yokohama, JP;

Noriaki Tokuda, Kawasaki, JP;

Masahiko Yasuda, Kawasaki, JP;

Shinji Mizutani, Kawasaki, JP;

Hiroaki Narushima, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/62 ; G03B027/42 ; G03F009/00 ;
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.


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