Norbert M Unzel

Title: Norbert M Unzel: Innovator in Photoresist Compositions

Introduction

Norbert M Unzel is a notable inventor based in Heitersheim, Germany. He has made significant contributions to the field of microelectronics, particularly in the development of photoresist compositions. With a total of two patents to his name, Unzel's work has had a considerable impact on the industry.

Latest Patents

Unzel's latest patents include innovative formulations that enhance the performance of photoresist materials. One of his patents focuses on photoresist compositions containing copolymers with acid-labile groups. This invention relates to novel maleimide copolymers that incorporate specific structural units, which are crucial for improving the efficiency of photoresist applications. Another patent involves tetra(hydroxphenyl) alkanes, which are used in positive photoresist compositions that are dissolved in organic solvents.

Career Highlights

Throughout his career, Norbert M Unzel has been associated with OCG Microelectronic Materials, Inc., where he has played a pivotal role in advancing the company's technological capabilities. His expertise in photoresist materials has positioned him as a key figure in the microelectronics sector.

Collaborations

Unzel has collaborated with several professionals in his field, including Ulrich Sch Adeli and Christoph De Leo. These collaborations have fostered innovation and have contributed to the successful development of new materials and technologies.

Conclusion

Norbert M Unzel's contributions to the field of microelectronics through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of photoresist compositions and their applications in technology.