Norbert Benesch

Title: Norbert Benesch: Innovator in Semiconductor Fabrication Monitoring

Introduction

Norbert Benesch is a notable inventor based in Nürnberg, Germany, recognized for his contributions to the field of semiconductor fabrication. With a total of 2 patents, he has developed innovative methods and devices that enhance the monitoring of finely structured surfaces during production processes.

Latest Patents

Benesch's latest patents include a "Method and device for optically monitoring fabrication processes of finely structured surfaces in a semiconductor production." This method involves providing reference signatures of finely structured surfaces, measuring at least one signature of a test specimen surface, and classifying the test specimen surface using comparison results. The classification process utilizes a neural network with learning capabilities and fuzzy logic. Additionally, he has patented an "Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces." This apparatus features a coherent radiation source and a detector unit that measures the intensity of radiation diffracted at a specimen, allowing for detailed analysis of periodic structures.

Career Highlights

Throughout his career, Norbert Benesch has worked with prominent organizations such as Semiconductor 300 GmbH & Co. KG and Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. His work has significantly impacted the semiconductor industry, particularly in the area of optical monitoring and measurement techniques.

Collaborations

Benesch has collaborated with esteemed colleagues, including Claus Schneider and Lothar Pfitzner, contributing to advancements in semiconductor technology.

Conclusion

Norbert Benesch's innovative patents and career achievements highlight his significant role in the semiconductor industry. His work continues to influence the development of advanced monitoring techniques in fabrication processes.