Infineon Technologies Ag

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Semiconductor 300 Gmbh & Co. Kg

Norbert Benesch

Claus Schneider

Lothar Pfitzner

A method for monitoring fabrication processes of finely structured surfaces in a semiconductor fabrication includes the steps of providing reference signatures of finely structured surfaces, measuring at least one signature of a test specimen surface, comparing the measured signature with the reference signatures, and classifying the test specimen surface by using the comparison results, wherein the measurement of the reference signatures is carried out by measuring the local distribution and/or intensity distribution of diffraction images on production prototypes having a specified quality. The classification is preferably carried out here with a neural network having a learning capability and/or a fuzzy logic. Furthermore, a device for carrying out the method is provided.

Method and device for optically monitoring fabrication processes of finely structured surfaces in a semiconductor production

An apparatus for measuring angle-dependent diffraction effects includes a coherent radiation source, a device for deflecting the coherent radiation in different directions, a spherical or aspherical mirror or mirror segments configured to correspond to a spherical or aspherical mirror, and a detector unit for measuring the intensity of the radiation diffracted at a specimen. The radiation deflected in different directions is reflected by the mirror configuration in such a way that the coherent beam is deflected onto the specimen with different angles of incidence in a temporally successively sequential manner. For this purpose, the angle of incidence of the measuring beam is altered continuously or in small steps. The intensities of the direct reflection (zero-order diffraction) and also of the higher orders of diffraction that may occur are measured. This evaluation allows conclusions to be drawn regarding the form and material of the periodic structures examined.

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Nürnberg, Germany

Norbert Benesch