The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Oct. 01, 2001
Infineon Technologies AG, Munich, DE;
Abstract
An apparatus for measuring angle-dependent diffraction effects includes a coherent radiation source, a device for deflecting the coherent radiation in different directions, a spherical or aspherical mirror or mirror segments configured to correspond to a spherical or aspherical mirror, and a detector unit for measuring the intensity of the radiation diffracted at a specimen. The radiation deflected in different directions is reflected by the mirror configuration in such a way that the coherent beam is deflected onto the specimen with different angles of incidence in a temporally successively sequential manner. For this purpose, the angle of incidence of the measuring beam is altered continuously or in small steps. The intensities of the direct reflection (zero-order diffraction) and also of the higher orders of diffraction that may occur are measured. This evaluation allows conclusions to be drawn regarding the form and material of the periodic structures examined.