Austin, TX, United States of America

Nora V Edwards

This inventor holds 1 USPTO granted patent. Top assignees: Freescale Semiconductor,inc., Infineon Technologies Ag. Active years: 2009.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Nora V Edwards: Innovator in Reflective Material Technology

Introduction

Nora V Edwards is a prominent inventor based in Austin, TX (US). She has made significant contributions to the field of materials science, particularly in the development of methods for enhancing reflective materials. Her innovative approach has led to advancements that improve the durability and reliability of these materials.

Latest Patents

Nora holds 1 patent for her invention titled "Methods of forming capping layers on reflective materials." This patent describes a process where a reflective material is heated to reduce internal stress, followed by the formation of a capping layer over it. The heating process minimizes internal stress, allowing for a more stable and continuous capping layer. This innovation ensures that the capping layer remains intact, protecting the underlying reflective material from contaminants and stress-induced degradation over time.

Career Highlights

Throughout her career, Nora has worked with notable companies such as Infineon Technologies AG and Freescale Semiconductor, Inc. Her experience in these organizations has allowed her to apply her expertise in materials science and contribute to various projects that enhance technology in the semiconductor industry.

Collaborations

Nora has collaborated with several professionals in her field, including her coworker Stefan Wurm. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in reflective materials.

Conclusion

Nora V Edwards is a trailblazer in the field of reflective materials, with her patented methods significantly impacting the industry. Her work continues to inspire advancements in materials science and technology.

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