The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Jan. 20, 2005
Stefan Wurm, Austin, TX (US);
Nora V. Edwards, Austin, TX (US);
Stefan Wurm, Austin, TX (US);
Nora V. Edwards, Austin, TX (US);
Infineon Technologies AG, Munich, DE;
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A reflective material is heated to reduce internal stress, and then a capping layer is formed over the reflective material. Heating the reflective material reduces the internal stress of the reflective material. Because the reflective material has reduced internal stress, a more continuous, stable and reliable capping layer is formed that is not subject to stress induced degradation over time due to the relaxing internal stress of the underlying reflective material. Thus, the capping layer remains intact and protects the reflective material residing beneath the capping layer from exposure to contaminants.