Noel Mower Chang

Title: The Innovative Contributions of Noel Mower Chang

Introduction

Noel Mower Chang is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of materials science, particularly in the development of silicon-containing films and halosiloxanes. With a total of four patents to his name, Chang's work has implications for various industrial applications.

Latest Patents

Chang's latest patents include a method for forming a film on a substrate using thiodisilane. This method involves heating the thiodisilane in a chemical vapor deposition (CVD) or atomic layer deposition (ALD) process to create a silicon-containing film. Another notable patent is a method for producing a halosiloxane, which combines water, a halosilane, and a specific solvent to form a reaction mixture. This innovative approach allows for the partial hydrolysis and condensation of the halosilane, resulting in a valuable reaction product mixture.

Career Highlights

Throughout his career, Chang has worked with prominent companies such as DDP Specialty Electronic Materials US 9, LLC and Dow Silicones Corporation. His experience in these organizations has allowed him to refine his expertise in materials science and contribute to cutting-edge research and development.

Collaborations

Chang has collaborated with esteemed colleagues, including Xiaobing Zhou and Barry M. Ketola. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Noel Mower Chang's contributions to the field of materials science through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and materials development.