Osaka, Japan

Nobuyuki Zettsu

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Osaka University. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Zettsu. Retrieved from https://idiyas.com/inventor/nobuyuki-zettsu-37eev9b7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Nobuyuki Zettsu: Innovator in Particle Film Technology

Introduction

Nobuyuki Zettsu is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of particle film technology. His innovative work has led to the development of a unique apparatus for producing particle films.

Latest Patents

Nobuyuki Zettsu holds a patent for a "Device for producing particle film and method for producing particle film." This invention involves an apparatus designed to produce a particle film by sweeping a meniscus area in a particle dispersion liquid. The apparatus forms the particle film on a substrate while evaporating a solvent in the meniscus area. It includes particle concentration measuring means for assessing the concentration of particles and particle concentration adjusting means to modify the concentration based on measurements.

Career Highlights

Zettsu is affiliated with Osaka University, where he continues to advance his research and development in particle film technology. His work has garnered attention for its potential applications in various industries.

Collaborations

He collaborates with notable colleagues, including Kazuya Yamamura and Kyohei Manabe, who contribute to his research endeavors.

Conclusion

Nobuyuki Zettsu's innovative contributions to particle film technology exemplify the impact of dedicated research and collaboration in advancing scientific knowledge. His patent reflects a significant step forward in the field, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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