The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Feb. 16, 2010
Applicants:

Nobuyuki Zettsu, Osaka, JP;

Kazuya Yamamura, Osaka, JP;

Kyohei Manabe, Osaka, JP;

Inventors:

Nobuyuki Zettsu, Osaka, JP;

Kazuya Yamamura, Osaka, JP;

Kyohei Manabe, Osaka, JP;

Assignee:

OSAKA UNIVERSITY, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 9/12 (2006.01); B05C 11/00 (2006.01); B05C 3/00 (2006.01); B05D 5/00 (2006.01); C09D 1/00 (2006.01); B05D 1/00 (2006.01);
U.S. Cl.
CPC ...
B05D 1/00 (2013.01); B05C 9/12 (2013.01); B05D 2252/04 (2013.01); B05D 2401/32 (2013.01);
Abstract

An apparatus () for producing a particle film according to the present invention is an apparatus for producing a particle film by sweeping a meniscus area () in a particle dispersion liquid () filling a space between a first substrate () and a second substrate () facing the first substrate () and by forming the particle film on the first substrate () while evaporating a solvent in the meniscus area (), including: particle concentration measuring means () for measuring a concentration of particles in the meniscus area (); and particle concentration adjusting means () for adjusting the concentration of particles in the meniscus area () in accordance with the particle concentration measured by the particle concentration measuring means ().


Find Patent Forward Citations

Loading…