Kyoto, Japan

Nobuyuki Shibayama

USPTO Granted Patents = 18 

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2007-2024

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18 patents (USPTO):Explore Patents

Title: Nobuyuki Shibayama: Innovator in Substrate Processing Technologies

Introduction: Nobuyuki Shibayama is a notable inventor based in Kyoto, Japan, with a remarkable portfolio of 18 patents. His innovations primarily revolve around substrate processing technologies, which play a crucial role in the manufacturing of electronic components. Shibayama's work is characterized by a commitment to enhancing efficiency and cleanliness in substrate processing methods.

Latest Patents: Among his latest patents, Shibayama has developed a substrate processing apparatus that features a sophisticated method for holding and processing substrates. One key aspect of this patent includes a substrate holding step where the substrate is held horizontally. This is followed by a chemical liquid supply step, wherein a chemical liquid is provided to the main surface of the substrate as it rotates. Additionally, his substrate processing method encompasses a cleaning-height maintaining step, ensuring that a first guard captures any expelled chemical liquid while keeping a consistent processing height. Another noteworthy patent involves a substrate processing method that incorporates an ozone-containing hydrofluoric acid solution, designed to clean the substrate's major surface effectively. It combines several steps including ozone water supplying to enhance cleaning efficacy.

Career Highlights: Shibayama has made significant contributions during his career at reputed companies such as Screen Holdings Co., Ltd. and Dainippon Screen Mfg. Co., Ltd. His innovative approach to substrate processing has solidified his status as an expert in the field, bringing forth advancements that benefit semiconductor and flat panel display manufacturing.

Collaborations: Throughout his career, Nobuyuki Shibayama has collaborated with esteemed colleagues, including Masayuki Hayashi and Tomonori Fujiwara. These partnerships have likely fostered an environment of innovation and shared expertise, contributing to the development of new processes and technologies in substrate processing.

Conclusion: Nobuyuki Shibayama's contributions to substrate processing highlight his dedication to innovation in the technology sector. With 18 patents to his name, his work continues to influence the efficiency and effectiveness of processes used in the production of electronic components. As technology advances, it will be exciting to see how his future inventions will shape the industry.

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