The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Mar. 21, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Nobuyuki Shibayama, Kyoto, JP;

Toru Edo, Kyoto, JP;

Hiromichi Kaba, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 1/00 (2006.01); B08B 1/04 (2006.01); B08B 3/08 (2006.01); B08B 7/04 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 3/10 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 1/002 (2013.01); B08B 1/04 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 7/04 (2013.01); H01L 21/0209 (2013.01); H01L 21/67028 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01); H01L 21/68792 (2013.01); B08B 2203/005 (2013.01);
Abstract

A substrate processing method is provided, which includes: a substrate holding step of causing a substrate holding unit to hold a substrate; an ozone-containing hydrofluoric acid solution supplying step of supplying an ozone-containing hydrofluoric acid solution containing ozone dissolved therein a hydrofluoric acid solution to one major surface of the substrate held by the substrate holding unit; a brush-cleaning step of cleaning the one major surface of the substrate by bringing a cleaning brush into contact with the one major surface of the substrate after the ozone-containing hydrofluoric acid solution supplying step; and an ozone water supplying step of supplying ozone water to the one major surface of the substrate before start of the brush-cleaning step after the ozone-containing hydrofluoric acid solution supplying step or in the brush-cleaning step.


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