Kariya, Japan

Nobuyuki Nunome

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Denso Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Nunome. Retrieved from https://idiyas.com/inventor/nobuyuki-nunome

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nobuyuki Nunome: Innovator in Semiconductor Manufacturing

Introduction

Nobuyuki Nunome is a prominent inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method for producing semiconductor wafers.

Latest Patents

Nobuyuki Nunome holds 1 patent for his invention titled "Method of manufacturing semiconductor wafers." This patent describes a manufacturing method that involves preparing an ingot with a peeling layer formed along its first major surface. The process includes applying a load to the ingot to facilitate the peeling of a wafer precursor, enhancing the efficiency of semiconductor production.

Career Highlights

Nobuyuki Nunome is associated with Denso Corporation, a leading company in the automotive components industry. His work at Denso has allowed him to focus on advancing semiconductor technologies, which are crucial for modern electronic devices.

Collaborations

Throughout his career, Nobuyuki has collaborated with talented individuals such as Sodai Nomura and Tomoki Kawazu. These collaborations have fostered innovation and contributed to the success of their projects.

Conclusion

Nobuyuki Nunome's contributions to semiconductor manufacturing exemplify the spirit of innovation in technology. His patented methods are paving the way for advancements in the industry, showcasing the importance of inventors in shaping the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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