Musashino, Japan

Nobuyuki Matsuda

This inventor holds 1 USPTO granted patent. Top assignee: Ntt Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Matsuda. Retrieved from https://idiyas.com/inventor/nobuyuki-matsuda-2twg1d59

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Nobuyuki Matsuda: Optical Nonlinearity Measurement

Introduction

Nobuyuki Matsuda is an inventor based in Musashino, Japan, and works at NTT Corporation. His patent work concerns methods for measuring the optical nonlinearity of two-dimensional materials.

Latest Patents

Matsuda is associated with 1 patent, titled “Measuring Method for Optical Nonlinearity of Two-Dimensional Material.” The method uses photon pairs generated through spontaneous four-wave mixing in an optical waveguide loaded with a two-dimensional material. It estimates nonlinear coefficients by fitting a theoretical photon-pair coincidence rate, derived from the coupled-wave equation, to measured results while accounting for the waveguide structure and the length of the attached material. Compared with the Z-scan method, the approach limits the influence of free carriers on nonlinear refractive-index measurements to an indirect effect.

Career Highlights

Matsuda’s disclosed invention applies optical-waveguide measurements to the characterization of two-dimensional materials. The patent describes a way to derive nonlinear coefficients from observed photon-pair coincidence rates.

Collaborations

Rai Takahashi and Yuya Yonezu are identified as Matsuda’s coworkers.

Conclusion

Nobuyuki Matsuda’s patent presents a photon-pair-based approach to measuring optical nonlinearity in two-dimensional materials, reflecting his work at NTT Corporation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…