Saitama-ken, Japan

Nobuyuki Masaki


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Saitama, JP (2012)
  • Saitama-ken, JP (2013)

Company Filing History:


Years Active: 2012-2013

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2 patents (USPTO):Explore Patents

Title: Innovations by Nobuyuki Masaki

Introduction

Nobuyuki Masaki is a notable inventor based in Saitama-ken, Japan. He has made significant contributions to the field of semiconductor device manufacturing. With a total of two patents to his name, Masaki's work focuses on enhancing substrate processing techniques.

Latest Patents

Masaki's latest patents include a substrate processing apparatus and a substrate annealing method. The substrate processing apparatus features a chamber capable of being evacuated, a substrate stage for mounting substrates, and a heating unit that heats the substrate through radiant heat without direct contact. Additionally, it includes a shutter that can be retracted into the space between the heating unit and the substrate. This innovative design allows for efficient annealing of the substrate. His vacuum heating apparatus prevents the deterioration of O rings due to radiation heating, ensuring effective heat treatment of substrates with excellent annealing properties.

Career Highlights

Nobuyuki Masaki is currently employed at Canon Anelva Corporation, where he continues to develop advanced technologies in semiconductor manufacturing. His expertise in substrate processing has positioned him as a key figure in the industry.

Collaborations

Masaki has collaborated with notable coworkers, including Yuichi Sasuga and Masami Shibagaki. Their combined efforts contribute to the innovative advancements in their field.

Conclusion

Nobuyuki Masaki's contributions to semiconductor device manufacturing through his patents and work at Canon Anelva Corporation highlight his importance as an inventor. His innovative approaches to substrate processing continue to influence the industry.

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