The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Dec. 14, 2009
Nobuyuki Masaki, Saitama-ken, JP;
Yuichi Sasuga, Yamanashi-ken, JP;
Masami Shibagaki, Fuchu, JP;
Hiroshi Doi, Chofu, JP;
Nobuyuki Masaki, Saitama-ken, JP;
Yuichi Sasuga, Yamanashi-ken, JP;
Masami Shibagaki, Fuchu, JP;
Hiroshi Doi, Chofu, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
A substrate processing apparatus includes a chamber capable of being evacuated, a substrate stage adapted to mount a substrate, a heating unit adapted to be set above the substrate mounting surface of the substrate stage, face the substrate mounted on at least the substrate mounting surface, and heat the substrate by radiant heat without being in contact with the substrate, a shutter adapted to be retractably inserted in the space between the heating unit and the substrate mounted on the substrate mounting surface, and a shutter driving unit adapted to extend/retract the shutter into/from the space. The substrate is mounted on the substrate stage to face the heating unit, the substrate is annealed by heating the substrate by radiant heat from the heating unit, and the shutter is extended into the space between the heating unit and the substrate stage.