This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2011.
Company Filing History:
Years Active: 2011
Title: Nobuyuki Kohda: Innovator in Liquid Immersion Lithography
Introduction
Nobuyuki Kohda is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of liquid immersion lithography, a crucial technology in semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of this process.
Latest Patents
Kohda holds 1 patent for his invention titled "Method for measuring liquid immersion lithography soluble fraction in organic film." This patent describes a method that includes a mounting step for a droplet of a liquid immersion medium on the surface of an organic film formed on a substrate. Additionally, it involves a transfer step that allows for the transfer of a component in the organic film into the droplet, thereby improving measurement accuracy.
Career Highlights
Nobuyuki Kohda is associated with Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of photomasks and chemical products for the semiconductor industry. His work has been instrumental in advancing the capabilities of liquid immersion lithography, which is essential for producing smaller and more efficient semiconductor devices.
Collaborations
Kohda has collaborated with notable colleagues such as Masaaki Yoshida and Takayuki Yajima. Their combined expertise has contributed to the successful development and implementation of innovative solutions in the semiconductor manufacturing process.
Conclusion
Nobuyuki Kohda's contributions to liquid immersion lithography exemplify the importance of innovation in the semiconductor industry. His patented method not only enhances measurement techniques but also supports the ongoing advancement of technology in this critical field.