Osaka, Japan

Nobuyuki Hiromori

This inventor holds 1 USPTO granted patent. Top assignee: Nitto-Denko Corporation. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Hiromori. Retrieved from https://idiyas.com/inventor/nobuyuki-hiromori

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Nobuyuki Hiromori: Innovator in Photosemiconductor Technology

Introduction

Nobuyuki Hiromori is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of photosemiconductor technology. His innovative work has led to the development of a unique photosemiconductor device and epoxy resin composition.

Latest Patents

Hiromori holds a patent for a photosemiconductor device and an epoxy resin composition for use in molding. This invention involves a photosemiconductor device that comprises a photosemiconductor element molded with a cured transparent epoxy resin composition. The cured transparent epoxy resin composition is characterized by a refractive index distribution curve defined by specific parameters.

Career Highlights

Nobuyuki Hiromori is associated with Nitto-Denko Corporation, where he has been instrumental in advancing photosemiconductor technologies. His work has not only contributed to the company's portfolio but has also enhanced the overall industry standards in photosemiconductor applications.

Collaborations

Hiromori has collaborated with notable colleagues, including Tadaaki Harada and Katsuya Muramatsu. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Nobuyuki Hiromori's contributions to photosemiconductor technology exemplify the impact of innovative thinking in the industry. His patent and collaborative efforts continue to influence advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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