This inventor holds 2 USPTO granted patents. Top assignee: General Atomic Company. Active years: 1981-1982.
Company Filing History:
Years Active: 1981-1982
Title: Nobuyoshi Ohyabu: Innovator in Plasma Technology
Introduction
Nobuyoshi Ohyabu is a prominent inventor based in La Jolla, CA (US). He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on advancing methods and systems for plasma generation, confinement, and control.
Latest Patents
Ohyabu's latest patents include innovative technologies such as "Double layer field shaping systems for toroidal plasmas." This patent describes methods and apparatus for plasma generation, confinement, and control, particularly in Tokamak plasma systems. The design features a two-layer field shaping coil system, which comprises an inner coil layer positioned close to the plasma and an outer coil layer that minimizes the current in the inner coil layer. Another notable patent is "Systems for merging of toroidal plasmas." This invention outlines methods and apparatus for merging tokamak plasmas, which have applications in pseudo steady-state tokamak operation, refueling, impurity removal, and plasma heating. In these systems, currents of two merging tokamak plasmas are directed in the same direction, allowing the plasma columns to attract each other under the control of appropriate guiding fields.
Career Highlights
Nobuyoshi Ohyabu is associated with General Atomic Company, where he continues to push the boundaries of plasma research and technology. His work has been instrumental in developing systems that enhance the efficiency and effectiveness of plasma operations.
Collaborations
Ohyabu has collaborated with notable colleagues, including Torkil H Jensen and Chung-Lih Hsieh. Their combined expertise contributes to the advancement of plasma technology and its applications.
Conclusion
Nobuyoshi Ohyabu's innovative work in plasma technology, particularly through his patents, showcases his commitment to advancing this critical field. His contributions are paving the way for future developments in plasma systems and their applications.