The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1982
Filed:
Jun. 28, 1978
Applicant:
Inventor:
Nobuyoshi Ohyabu, La Jolla, CA (US);
Assignee:
General Atomic Company, San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21B / ;
U.S. Cl.
CPC ...
376133 ; 376142 ;
Abstract
Methods and apparatus for plasma generation, confinement and control such as Tokamak plasma systems are described having a two layer field shaping coil system comprising an inner coil layer close to the plasma and an outer coil layer to minimize the current in the inner coil layer.
Quick Actions:
Ohyabu, Nobuyoshi. (1982). Double layer field shaping systems for toroidal plasmas (U.S. Patent No. 4330864). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4330864
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile