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For the Inventor, By the Inventor

Mie, Japan

Nobuyasu Nishiyama

This inventor holds 9 USPTO granted patents and 2 published patent applications. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2010-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyasu Nishiyama. Retrieved from https://idiyas.com/inventor/nobuyasu-nishiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 66.7

Average Co-Inventor Count = 1.7

ph-index = 5

Forward Citations = 50(Granted Patents)


Location History:

  • Yokohama, JP (2010)
  • Yokkaichi, JP (2010 - 2011)
  • Kanagawa, JP (2010 - 2011)
  • Mie, JP (2014)

Company Filing History:

goldMedal9 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2010-2014

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9 patents (USPTO):Explore Patents
1. 8833388 - Pressure controlling apparatus (2014-09-16),
2. 8760053 - Power supply control device, plasma processing device, and plasma processing method (2014-06-24),
3. 8651135 - Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting method (2014-02-18),
4. 8062938 - Semiconductor device and method of fabricating the same (2011-11-22),
5. 8036036 - Semiconductor device and a manufacturing method thereof (2011-10-11),
6. 7906435 - Semiconductor device and a manufacturing method thereof (2011-03-15),
7. 7767582 - Method of manufacturing semiconductor device (2010-08-03),
8. 7723807 - Semiconductor device and a manufacturing method thereof (2010-05-25),
9. 7683436 - Semiconductor device having a pole-shaped portion and method of fabricating the same (2010-03-23),

Title: Nobuyasu Nishiyama: Innovator in Pressure Control and Plasma Processing Technologies

Introduction

Nobuyasu Nishiyama is a prominent inventor based in Mie, Japan. He has made significant contributions to the fields of pressure control and plasma processing technologies. With a total of 9 patents to his name, Nishiyama continues to push the boundaries of innovation.

Latest Patents

Nishiyama's latest patents include a pressure controlling apparatus designed to enhance efficiency in various applications. This apparatus features a detecting unit, an exhaust pipe, a regulating valve, and a pressure controlling unit. The regulating valve is equipped with a valve port that communicates with the exhaust pipe, and a changing unit that alters the shape of the valve port. Additionally, a slide valve regulates the opening degree of the valve port, allowing for precise control of pressure.

Another notable patent is a power supply control device for a plasma processing device. This device includes a plasma generation unit that produces plasma within a process chamber. The power supply control device comprises a radio frequency power supply, a storage unit, and a matching circuit. The matching circuit is responsible for matching impedances based on stored matching information, which is crucial for optimizing the plasma processing conditions.

Career Highlights

Nobuyasu Nishiyama is currently employed at Kabushiki Kaisha Toshiba, where he applies his expertise in developing advanced technologies. His work has significantly impacted the efficiency and effectiveness of various industrial processes.

Collaborations

Throughout his career, Nishiyama has collaborated with notable colleagues, including Hideo Eto and Makoto Saito. These collaborations have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Nobuyasu Nishiyama is a distinguished inventor whose work in pressure control and plasma processing technologies has garnered attention in the industry. His innovative patents and collaborations reflect his commitment to advancing technology and improving industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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