This inventor holds 2 USPTO granted patents. Top assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.. Active years: 1986-1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 1986-1989
Title: Nobuyasu Hayashi: Innovator in Exposure Apparatus Technology
Introduction
Nobuyasu Hayashi is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 2 patents. His work has been instrumental in enhancing the accuracy and efficiency of exposure systems used in various applications.
Latest Patents
Hayashi's latest patents include innovative designs for exposure apparatuses. The first patent describes an exposure apparatus designed for forming a fluorescent screen over the inner surface of a color cathode ray tube. This invention features a drive device that automatically aligns a short-arc mercury-vapor lamp, ensuring precise exposure accuracy. The design corrects arc variations based on the lighting period of the lamp, enhancing the overall performance of the apparatus.
The second patent focuses on an exposure apparatus where a light source, housed under a cover with a partial opening, is positioned to face an exposed surface through a transparent faceplate. This apparatus incorporates a saddle-shaped lens that improves exposure accuracy by reducing the apparent movement of the light source during rotation.
Career Highlights
Throughout his career, Nobuyasu Hayashi has worked with prominent companies such as Hitachi, Ltd. and Hitachi Device Engineering Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in exposure technology.
Collaborations
Hayashi has collaborated with notable colleagues, including Takashi Fujimura and Misao Kokabu. Their combined expertise has contributed to advancements in the field of exposure apparatus technology.
Conclusion
Nobuyasu Hayashi's contributions to exposure apparatus technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the technical challenges in this field, and his work continues to influence the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile