The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 1986

Filed:

Feb. 27, 1985
Applicant:
Inventors:

Nobuyasu Hayashi, Chiba, JP;

Takashi Fujimura, Mobara, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G02B / ;
U.S. Cl.
CPC ...
354-1 ; 350432 ;
Abstract

In an exposure apparatus of the type in which a light source, formed by fixing a light emitting tube, housed uner a cover except a partial opening, inside a lamp housing filled with cooling water, is disposed in such a fashion that the opening faces an exposed surface via a transparent faceplate of the lamp housing and the light source is rotatable with the center axis of the exposed surface, perpendicular thereto, being the axis of rotation, the invention discloses an exposure apparatus wherein the faceplate of the lamp housing consists of a saddle-shaped lens having a concave surface in the radial direction of the light emitting tube and a convex surface in the axial direction. Ths exposure apparatus reduces the apparent movement of the light source with the rotation of the light source portion, and can improved exposure accuracy.


Find Patent Forward Citations

Hayashi, Nobuyasu. (1986). Exposure apparatus (U.S. Patent No. 4586799). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4586799

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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