Nobuya Imazeki

Title: Nobuya Imazeki: Innovator in Semiconductor Technology

Introduction

Nobuya Imazeki is a notable inventor based in Ibaraki-ken, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of innovative methods for forming conductive patterns on substrates. With a total of 3 patents to his name, Imazeki's work has had a considerable impact on the industry.

Latest Patents

Imazeki's latest patents include a dispersion containing Cu ultrafine particles individually dispersed therein. This dispersion comprises an organic solvent that is hardly evaporated at room temperature but can be evaporated during a drying-firing step. This process is essential for forming Cu-distributing wires on semiconductor substrates. The ultrafine particles have a particle size of not greater than 0.01 µm, and the dispersion allows for the complete embedding of fine wiring grooves and contact holes on LSI substrates, resulting in a conductive and uniform pattern.

Another significant patent is a method for forming a Cu-thin film. This method involves coating a semiconductor substrate with a dispersion of Cu-containing ultrafine particles. The substrate is then fired in an atmosphere that decomposes organic substances without oxidizing the Cu. This technique allows for the filling of recessed portions of LSI substrates with a Cu-thin film, enabling the creation of fine patterns at a low processing cost.

Career Highlights

Throughout his career, Nobuya Imazeki has worked with various companies, including Vacuum Metallurgical Co., Ltd. His expertise in semiconductor technology has positioned him as a key figure in the development of advanced materials and processes.

Collaborations

Imazeki has collaborated with notable individuals in the field, including Masaaki Oda and Hiroyuki Yamakawa. These collaborations have further enhanced his contributions to semiconductor innovations.

Conclusion

Nobuya Imazeki's work in semiconductor technology exemplifies the importance of innovation in creating efficient and effective manufacturing processes. His patents reflect a commitment to advancing the field and improving the capabilities of semiconductor devices.