Kawasaki, Japan

Nobutoshi Abe

This inventor holds 3 USPTO granted patents. Top assignee: Nippon Kogaku K.k.. Active years: 1983-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobutoshi Abe. Retrieved from https://idiyas.com/inventor/nobutoshi-abe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 87(Granted Patents)


Company Filing History:


Years Active: 1983-1987

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3 patents (USPTO):Explore Patents

Title: Nobutoshi Abe: Inventor in Substrate Inspection and Cleaning.

Introduction

Nobutoshi Abe is an inventor associated with Kawasaki, Japan, and Nippon Kogaku K.K. His listed portfolio includes 3 patents, with inventions focused on inspecting and cleaning planar substrates.

Latest Patents

Abe’s listed patents include an automatic photomask or reticle washing and cleaning system. The system transfers substrates from a case to a cleaning unit, where liquid and rubbing mechanisms remove foreign particles, and then to an inspection unit before returning them to the case. It combines cleaning and inspection in an automated process.

Another listed invention, an apparatus for detecting foreign matter on a planar substrate, scans the substrate with an oblique light beam and detects scattered light. It also eliminates stray light that could interfere with identifying foreign particles.

Career Highlights

Abe’s patent work reflects an emphasis on substrate cleanliness and reliable inspection. These capabilities are important in manufacturing processes where particles on photomasks, reticles, or other planar substrates can affect production quality.

Collaborations

Abe’s listed coworkers include Kazunori Imamura and Akikazu Tanimoto. His company affiliation is Nippon Kogaku K.K.

Conclusion

Nobutoshi Abe’s recorded inventions address automated substrate cleaning and foreign-particle detection, highlighting practical approaches to inspection and contamination control.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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