The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1987
Filed:
Feb. 04, 1987
Nobutoshi Abe, Kawasaki, JP;
Kazunori Imamura, Tokyo, JP;
Nippon Kogaku K. K., Tokyo, JP;
Abstract
Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again. In the washing and cleaning system, the washing and cleaning unit has a wash tub, means disposed in the wash tub for spraying or jetting a cleaning liquid against the surface of a substrate, means for rubbing the surfaces of the substrate which are wetted by the cleaning liquid, thereby removing foreign particles and washing means for washing away the cleaning liquid still remaining over the surfaces of the substrate even after removal of foreign particles.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile