This inventor holds 2 USPTO granted patents. Top assignee: Fuji Photo Film Company, Limited. Active years: 1990.
Company Filing History:
Years Active: 1990
Title: Nobuo Nishikawa: Innovator in Lithographic Printing Technology
Introduction
Nobuo Nishikawa is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of lithographic printing technology. With a total of 2 patents, his work has advanced the methods used in producing high-quality printing plates.
Latest Patents
Nishikawa's latest patents include a process for producing presensitized diazo resin lithographic printing. This process involves coating a surface-roughened aluminum plate with a solution containing a negative-working, light-sensitive composition. This composition is developable with an aqueous alkali developer, ensuring high-quality results. Another significant patent is for producing a photosensitive negative working diazo resin. This process entails coating a substrate with a photosensitive composition that includes a photosensitive diazo resin and a linear organic polymer.
Career Highlights
Nobuo Nishikawa has had a distinguished career at Fuji Photo Film Company, Limited. His innovative approaches have led to advancements in lithographic printing technology, making him a key figure in the industry. His patents reflect his commitment to improving printing processes and materials.
Collaborations
Nishikawa has collaborated with notable coworkers such as Shigeo Koizumi and Nobuyuki Kita. These partnerships have contributed to the development of his innovative technologies and have fostered a collaborative environment for research and development.
Conclusion
Nobuo Nishikawa's contributions to lithographic printing technology through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and improve printing processes.