The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 1990
Filed:
Feb. 17, 1988
Applicant:
Inventors:
Assignee:
Fuji Photo Film Co., Ltd., Minami-ashigara, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430169 ; 430175 ; 430177 ; 430302 ;
Abstract
A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:
Koizumi, Shigeo. (1990). Process for producing photosensitive negative working diazo resin (U.S. Patent No. 4917988). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4917988
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