Osaka, Japan

Nobuki Matsuura

This inventor holds 1 USPTO granted patent. Top assignee: Konishi Co., Ltd.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuki Matsuura. Retrieved from https://idiyas.com/inventor/nobuki-matsuura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Nobuki Matsuura: Innovator in Epoxy Resin Technology

Introduction

Nobuki Matsuura is a distinguished inventor based in Osaka, Japan. He is known for his contributions to the field of epoxy resin technology. His innovative work has led to the development of a unique one-pack moisture-curing epoxy resin composition.

Latest Patents

Matsuura holds a patent for a one-pack moisture-curing epoxy resin composition. This composition can be cured at ordinary temperatures and is improved in storage stability without impairing the quickness of curing. It excels in two properties that are typically incompatible. The composition includes one or more members selected from vinyl carboxylates and epoxy-containing silyl compounds, along with ketimines, oxazolidines, and an epoxy resin.

Career Highlights

Matsuura is currently employed at Konishi Co., Ltd., where he continues to innovate in the field of epoxy resins. His work has significantly impacted the industry, providing solutions that enhance the performance and usability of epoxy materials.

Collaborations

Matsuura has collaborated with notable coworkers, including Hisakazu Horii and Takeshi Endo. Their combined expertise has contributed to the advancement of epoxy resin technologies.

Conclusion

Nobuki Matsuura's innovative contributions to epoxy resin technology demonstrate his commitment to advancing materials science. His patent for a moisture-curing epoxy resin composition showcases his ability to solve complex challenges in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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