This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mitsubishi Materials Corporation. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Nobuhisa Masuda: Innovator in Gas Separation Technology
Introduction
Nobuhisa Masuda is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of chemical engineering, particularly in the area of gas separation technologies. His innovative methods have the potential to enhance efficiency in industrial processes.
Latest Patents
Masuda holds a patent for a "Method for separating and recovering conversion reaction gas." This patent outlines a process for producing trichlorosilane from hydrogen gas and silicon tetrachloride. The method includes several key steps: a condensing step for cooling discharged gas, a separating step for silicon tetrachloride from the condensed liquid, and a recovery step for disilicon hexachloride. The process involves a first distillation for trichlorosilane, a second for silicon tetrachloride, and a third for disilicon hexachloride, showcasing a comprehensive approach to gas separation.
Career Highlights
Nobuhisa Masuda is associated with Mitsubishi Materials Corporation, where he applies his expertise in chemical processes. His work has been instrumental in advancing the company's capabilities in gas separation technologies. With 1 patent to his name, Masuda continues to contribute to the field through innovative solutions.
Collaborations
Masuda collaborates with Noboru Tachino, a fellow professional in the industry. Their partnership exemplifies the importance of teamwork in driving innovation and achieving breakthroughs in technology.
Conclusion
Nobuhisa Masuda's contributions to gas separation technology reflect his dedication to innovation and efficiency. His patented methods have the potential to significantly impact industrial processes, making him a noteworthy figure in the field of chemical engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
