This inventor holds 1 USPTO granted patent. Top assignee: Rasa Industries, Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Nobuhiro Oshita: Semiconductor Etching Innovation.
Introduction
Nobuhiro Oshita is an inventor associated with Rasa Industries, Ltd. in Tokyo, Japan. His work includes a patent for an etching solution composition designed for semiconductor manufacturing.
Latest Patents
Oshita is credited with 1 patent, titled “Etching Solution Composition.” The invention concerns an inorganic acid-based solution for selectively removing silicon nitride from semiconductor materials that also contain silicon oxide. It combines an etch inhibitor to reduce the etching of silicon oxide with a deposition inhibitor to limit silica buildup on the silicon oxide surface. The composition is intended to support higher silicon nitride etch selectivity while reducing silica deposition.
Career Highlights
Oshita’s listed patent reflects work on chemical processes relevant to semiconductor fabrication. His company affiliation is Rasa Industries, Ltd., based in Japan.
Collaborations
Sho Nagao is identified as Oshita’s coworker. The available information does not specify their roles or describe a particular joint project.
Conclusion
Nobuhiro Oshita’s patent addresses a semiconductor etching challenge by combining selective silicon nitride removal with measures to reduce silica deposition.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile