Nobuhiro Endo

Title: Nobuhiro Endo: Innovator in Semiconductor Technology

Introduction

Nobuhiro Endo is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in nonvolatile memory devices. With a total of 5 patents to his name, Endo's work has had a lasting impact on the industry.

Latest Patents

Endo's latest patents focus on advancements in semiconductor nonvolatile memory cells. One notable invention involves a floating-gate type nonvolatile memory cell, where the second dielectric film between the floating gate and the control gate has a much higher relative permittivity than the first dielectric film. This innovation ensures that the relations of relative permittivity and film thickness are maintained, leading to improved performance in terms of writing and erasing voltages. Another patent describes a metal-insulator-semiconductor gate insulating structure that enhances the functionality of non-volatile memory devices. These inventions demonstrate Endo's commitment to pushing the boundaries of semiconductor technology.

Career Highlights

Throughout his career, Nobuhiro Endo has worked with notable companies such as NEC Corporation and Nippon Electric Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Endo has collaborated with esteemed colleagues, including Yukinori Kurogi and Kohetsu Tanno. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Nobuhiro Endo is a distinguished inventor whose work in semiconductor technology has led to significant advancements in nonvolatile memory devices. His innovative patents and collaborations highlight his dedication to the field and his impact on the industry.